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Nevertheless, film surface roughness increases abruptly at 700 K.
Thin film surface roughness decreases as substrate temperature increases from 300 K to 600 K.
Film surface roughness, measured using a profilometer, does not depend strongly on RB.
The SERS enhancements observed in the nanostructured Au films (obtained with 500 mM HCOONa) resulted from the deposition of many Au NPs on the surface, increasing the film surface roughness, which promotes electromagnetic field enhancements, resulting in more active sites for molecule adsorption.
The larger pore size of the S TiO2 MeOH films allowed easier transport of MC-LR inside the porous film, while the higher film surface roughness could increase nano-interfacial interactions between MC-LR and surface active sites.
This work focuses on the study of the dependence of film surface roughness and slope on lattice size in thin film deposition processes.
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The films surface roughness varied between 2 and 12 nm, and approximately decreases with increasing power of Ca target.
By processing the topographical images of the surface of Pd thin films, surface roughness was erased resulting to well-separated hillocks over the surface.
In this way, the basic validity of the methodology could be investigated with minimal complications from effects related to microstructure, oxide films, surface roughness etc.
We present the results of investigation pertaining to the influence of the neon ion energy and angle of incidence on the beryllium films surface roughness.
The increase in films' surface roughness probably attributed to the coalescence of grains in the film structure that leads to the formation of large grain aggregates.
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