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The modelled temperature profile across the film thickness shows that the film surface has an higher temperature as compared to the interface with the substrate.
Concurrently, simulation of the effect of ion bombardment onto a film surface has been performed by the use of ©SRIM 2003 to estimate sputtering yields of its different constituting elements.
The microstructural properties of as-deposited films were thoroughly examined using the Rietveld refinement of powder-like XRD patterns, while the film surface has been probed using atomic field microscopy.
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The resputtering effect due to the high-energy ion bombardment on the film surface had significantly influenced the deposition rate and film's composition.
The phase domains on the film surface have also been resolved by frictional force microscopy (FFM) using hydrophilic tips bearing hydroxyl groups.
Furthermore, chemical composition, phase identification and morphology of the film surface have been characterized using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM).
It is shown that high vacuum annealing induces reduction of V2O5 into lower oxides by XPS spectrum, as well, fine grains and a more homogeneous film surface have also been observed in the AFM images.
The presence of new functional groups on the film surfaces has been assessed by ATR-FTIR spectra after chemical derivatization.
The GaN thin-film surface has a root-mean-square (RMS) roughness of 0.3 nm as revealed by AFM.
In this study poly-ɛ-caprolactone film surfaces have been modified through aminolysis and immobilization process.
Bulk-filled uniaxially oriented poly ethylene terephthalate) film surfaces have been investigated by scanning force microscopy.
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