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Effect of contact temperature on wear is also included using a simplified thermo-elastohydrodynamic analysis in conjunction with fractional film defect concept.
For lower duty cycles an enhanced corrosion protection was observed due to a densification of the CrNx film microstructure and a decrease of the film defect density.
In this study, chromium nitride (CrNx) films were optimized by high power impulse magnetron sputtering (HiPIMS) in order to reduce the film defect density.
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A description of oxide film defects and defect transport are presented.
Annealing at 250 °C in reducing H2 atmosphere enhanced thermoelectric properties by reducing film defects.
Foam often causes problems during manufacture and packaging, and during application it often causes film defects such as bubbles and subsequent thin spots.
At all temperatures, salt rejection increases after introduction of humic acid, probably due to membrane modification and sealing of thin film defects.
In this paper, we present an effective defect inspection system that identifies film defects and determines their types in order to produce polarized films for TFT-LC D(thin film transistor – liquid crystal display).
Film defects and their control in processing are major problems which must be addressed in the choice of materials and coating process for thin film applications.
When a cast Al-7Si-0.3Mg alloy with the oxide film defects, is subjected to the HIPping treatment then the applied pressure at the temperature close to its melting temperature induces a substantial plastic deformation in the casting.
The change of flow direction through L-junctions can yield a high coefficient of discharge Cd, without entrapping detrimental oxide film defects because of the smooth flow, minimizing surface turbulence.
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