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The device fabrication started with the isolation of the mesa, which was formed by inductively coupled plasma (ICP) with an etching depth of 100 nm.
Device fabrication started with the definition of a sample DFB grating on upper InGaAs layer, as is similar to ref. [14].
The manufacturing drawing, manufacturing and inspection plan of VV sector with supporting fabrication procedures are also verified by ANB, accordingly the first cutting and forming of plates for VV sector fabrication started from February 2012.
The LED fabrication started by thoroughly cleaning the PEDOT PSS substrate with acetone and iso-propanol under sonication for 3 min. Then, the TFB hole transporting solution was spun coated at 1,500 rpm for 30 s, followed by baking for 10 min at 75°C to evaporate the residual toluene.
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Ideally direct electrochemical formation of Ag and Pd foam structures without any additive reagent does not lead to a desired result; however, indirect fabrication starting from electrochemically fabricated Cu foam seems promising.
The fraudster forges a new identity, finds a new friendly forum to infiltrate, and the fabrication starts all over again.
The fabrication starts with tri-layer, sequential low-pressure chemical vapor deposition of 25-nm-thick Si3N4, 70-nm-thick poly-Si0.85Ge0.15, and finally, a capping layer of a 5-nm-thick SiO2 over a Si substrate.
The fabrication starts with silicon wafers insulation by thermal oxidation.
Fabrication starts with exfoliation of MoS2 (ref (2)) onto an SiO2/Si substrate.
The device fabrication starts with a pre-stretched elastomer, laminated on a flexible frame structure.
The fabrication start with the pattering of nitride layer using mask # 1. Afterward, thermal oxidation is performed to grow the oxide layer.
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Justyna Jupowicz-Kozak
CEO of Professional Science Editing for Scientists @ prosciediting.com