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In addition to the much simplified fabrication process, the fabricated device displays enhanced programming properties and desirable data retention behavior.
For example, if the device had been fabricated into the traditional structure in our fabrication process, the electrodes should have covered more than half effect area of BP.
According to our proposed fabrication process, the cross section of the fabricated vessel model is square because the cross-section of the patterned photoresist is square.
In this fabrication process, the 10-μm-sized microchannel can be fabricated by using laser lithography (step 1 in Fig. 5).
The fabrication process, the circuit and the photograph are shown in Figure 5.
During fabrication process, the HF etching period was strictly controlled between tmin and tmax.
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Figure 1 illustrates the fabrication process of the tungsten nanowires.
Figure 2 The fabrication process of the proposed structure.
The fabrication process of the three samples proceeded as follows.
Figure 1(b) shows the fabrication process of the device.
The fabrication process for the electrodes is described.
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