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A CMOS compatible fabrication process is proposed and used to fabricate prototypes.
Surface micromachining fabrication process is employed on the high resistivity silicon substrate to fabricate the filter.
The surface micromachining fabrication process is employed on the high resistivity silicon substrate to fabricate the filter.
The fabrication process is described.
The detector fabrication process is briefly described.
The fabrication process is fast and flexible.
The fabrication process is described as followed.
The fabrication process is referred as follows.
The fabrication process is free of any nanolithography.
Here, a two-stage fabrication process is proposed.
Therefore, a suitable design and fabrication process is required.
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