Sentence examples for fabrication depth from inspiring English sources

We begin by clarifying important terms of the trade by looking at Integrated Circuits (ICs) from five different perspectives, namely (1) circuit complexity, (2) functionality and markets, (3) fabrication depth, (4) design process, and (5) business model.

Lastly, the final fabrication depth in the central 2 × 2 μm2 area was about 3.9 nm.

Effect of normal load and KOH etching period on fabrication depth was separately clarified.

Figure 5 Variation of fabrication depth of Si/Si 3 N 4 sample with etching period in KOH solution.

Due to the excellent masking ability of the Si3N4 film, the maximum fabrication depth of 2.5 μm can be achieved.

Experimental results suggested that the fabrication depth increased with the increase of the scratching load or KOH etching period.

It was found that under the same contact pressure, the fabrication depths were almost the same for various etching temperatures.

To verify it, the fabrication depths under various contact pressures and etching temperatures were tested, and the results were summarised in Table 1.

Compared to the bare silicon wafer, the reflections of the array were greatly reduced depending on the process conditions (spin speed and concentration) of the nanosilver island fabrication and etched depth.

Although in actual fabrication the etch depth is 1.4 μm, 0.2 μm has been omitted in this simulation because that is for the GaAs contact layer of higher refractive index and sufficiently far away from the inserted light source that it need not be included when simulating the mode propagation.

The research of nanoparticles with unique dimensionality dependent on the chemical-physical properties of nanoscale matter has propelled efforts towards controllable fabrication and in-depth characterization of inorganic nanostructures with desirable compositional and geometric features.