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The accuracy of between designed and fabricated pattern could be maintained above 1 μm.
The fabricated pattern contained ceiling "ridges" that promote chaotic mixing effect in the fluid channel.
Figure 3 Change of contact angle by fabricated pattern using hot embossing lithography.
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A good hydrophilic/hydrophobic contrast of the fabricated patterns on the fabric and a well-controlled liquid capillary penetration was achieved in the patterns.
This assembly enabled post-processing analysis of the fabricated patterns by removing one plate.
Hence, the fabricated patterns were almost composed of damage-free monocrystalline silicon structures.
The relation between designed and fabricated patterns is compared for both technological versions.
The growth of CNTs was mostly observed on the edges of the fabricated patterns as shown in Fig. 5a.
Figure 3 shows examples of the fabricated patterns where the widths of the target patterns were 5, 10, 20, 50 and 100 μm, respectively.
The AFM image of fabricated patterns with a depth of 10 nm and secondary etching of 0.5 nm are shown in Fig. 4a.
Microstructures of the film stacks and top-views of the fabricated patterned media were observed using transmission electron microscopy (TEM) and scanning electron microscopy (SEM), respectively.
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