Sentence examples for extension space from inspiring English sources
Khas Parda is proposed to be installed as the facade of the community extension space.
Sacrificing the posterior cruciate ligament (PCL) selectively opens the flexion space approximately 2 mm more than the extension space, which accounts for some of the technical differences.
It has been proved that a tibial overresection of 1 mm increases the extension space by 4° [4°].
Case (i) is a particular version of a result in [29] (see Corollary 2.17 there or Corollary 3.4 in [5]), where the non-metrizable case - X is an approximative absolute neighborhood extension space (AANES) for compact topological spaces - is considered (compact AANRs are AANES for compact spaces).
A space Y is an approximate extension space for Q (written (Y inoperatorname{AES}(Q))) if, (forall alphain operatorname{Cov} (Y)), (forall X in Q), (forall K subseteq X ) closed in X, and any continuous function (f_{0}:K to Y), there exists a continuous function (f:X to Y ) such that (f|_{K} ) is α-close to (f_{0}).
A space Y is an extension space for Q (written (Y inoperatorname{ES}(Q))) if, (forall X in Q) and (forall K subseteq X ) closed in X, any continuous function (f_{0}:K to Y ) extends to a continuous function (f:X to Y).
The balance between the flexion and extension spaces is very important even when using a hinged total knee implant.
Various knee balancers have been developed to assist surgeons in balancing the flexion and extension spaces during total knee arthroplasty.
Fundamental differences in implant design and the relative size of the flexion and extension spaces suggest that subtle, different surgical techniques should be used for cruciate-retaining and posterior-substituting total knee arthroplasties.
The halo-to-extension spacing is the most effective design parameter to control the band-to-band leakage current and the threshold-voltage roll-off.
The sidewall oxide of the insulated shallow extension structure demonstrates the feasibility of the precise control of the halo-to-extension spacing to achieve a sub-50 nm bulk MOSFET with fully CMOS compatible process.
