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Pre-etching masked InP wafers with PCl3 reduce the effect of excessive edge growth enhancement in subsequent selective area growth (SAG) and improves wafer planarity that is beneficial to the fabrication of integrated optoelectronic devices.
Colloidal graphite films, showing sub-micron plate-like morphology with excessive edge graphitic planes exposed, are excellent counter electrodes (CE) in DSCs, surpassing in efficiency the commonly used very expensive platinum (Pt) analogues and considerably reducing the cell fabrication costs.
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In order to make the network structure diagram simplification, self-loop and excessive edges are eliminated in the grid. .
In order to make the network structure diagram simplification, self-loop and excessive edges are eliminated in the grid.
Therefore, at most, 4| V | excessive edges are visited for each non-excessive edge.
If t c >0, c can be written as c = p1 e1 p2 e2... e tc p tc+1, where e k (1 ≤ k ≤ t c) is a non-excessive edge and p k (1 ≤ k ≤ t c+1) is a possibly empty path that contains only excessive edges.
Straight arrows represent non-excessive edges, while jagged lines represent sequences of excessive edges.
Edges in E N ∪ E D are omitted, and the flow on each edge in E D has been subtracted from the flow of a corresponding edge in E S. Figure 6 An example of a chromosome that consists of non-excessive and excessive edges.
Note that a non-excessive edge e can be visited, at most, n e -times.
Let t c be the number of non-excessive edges visited by c.
It may be hypothesised that there is a cumulative threshold of contact stress that must be exceeded by repeated episodes of edge-loading before resulting in significant localised excessive wear (edge-wear).
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