The stability of Mo/Si multilayer mirrors under extreme ultraviolet (EUV) radiations has been investigated.
Due to the absorption of extreme ultraviolet (EUV) light in the projection optical system of an EUV lithography machine, its mirrors thermally deform resulting in wavefront errors (WFEs) that deteriorate the imaging process.
Recent development of multilayer mirror and its applications in extreme ultraviolet (EUV), soft X-ray ranges in China was reviewed in this paper.
The instrument, basically consisting of two spectrophotometers (EUV: 50 150 nm, FUV: 145 330 nm) and one scanning mirror, aims at measuring emission lines from molecules, atoms and ions present in the tenuous atmosphere of Mercury.
The algorithm has also been developed with two specific areas in mind: a W/C broad angle super-mirror for hard X-ray applications and a Mo/Si wide band super-mirror operating at normal incidence in the EUV spectral region.
The combination of good optical properties and high thermal stability of interface-engineered Mo/C/Si/C multilayer mirrors underlines their potential for their use in EUV optics.
A focusing mirror device was designed and installed in an extreme ultraviolet (EUV) beamline of the SPring-8 Compact SASE Source (SCSS).
The interfaces in La/B4C and LaN/B4C multilayer mirrors designed for near normal incidence reflection of 6.x nm EUV light were investigated by grazing incidence X-ray reflectometry, high-resolution transmission electron microscopy and EUV reflectometry.
Transition Region and Coronal Explorer and the Solar and Heliospheric Observatory, EUV telescopes devoted to solar observations, and are unique in that they use normal incidence mirrors over narrow wavelength bands to make images of the Sun.
Diverting mirrors will allow users to select the proper beam path for each monochromator or EUV exposure station thus matching the wavelength region to the intended experiment.
While spectral filtering of individual harmonic requires a periodic multilayer mirror exhibiting a small reflection bandwidth <3 eV to separate adjacent harmonics, the reflection of attosecond EUV pulses without compromising the time structure of the pulse requires aperiodic multilayer systems with large reflection bandwidth and optimized phase.
