Sentence examples for etching times from inspiring English sources

(a) PL spectra in the wavelength range from 1.0 to 2.0 μm of the as-grown and etched SiGe/Si MQW samples with different etching times.

The length of these chemically etched nanopillars can be controlled by applying different etching times.

Figure 5 SIMS curves of Si/Pd samples etched in HF/V 2 O 5 for different etching times.

Figure 8 Photoluminescence spectra of Si samples etched in HF/V 2 O 5 for different etching times.

The resistivities of the etched films also depend significantly on etching time; longer etching times lead to higher ρ values presumably due to the formation of defects (see Supporting Information Table S2), in agreement with previous work.

Figure 9 Reflectance curves of etched samples in HF/V 2 O 5 (0.12 M) at different etching times.

We designed the textured glass surface morphologies with big square craters to smaller pyramids for various glass etching times from 30 to 75 min.

The reflection decreased after longer etching times.

Figure 6b shows the normalized EQE for various etching times.

This can be seen for both etching times shown.

Typical etching times were 30 min to remove the resist.