Sentence examples for etching processes from inspiring English sources

Si3N4 and SiO2 thin films were then etched away by reactive ion etching processes to expose the Si substrate for the subsequent KOH etching.

Therefore, etching processes with no or negligible damage are required.

In etching processes moist surfaces become rougher than dry substrates.

This includes etching processes, colloidal assemblies, deposition methods, and in situ growth of surface features.

To achieve these specifications, two optimized inductively coupled plasma (ICP) etching processes are developed.

Successful strategies to reduce the blurring based on etching processes and novel stencil designs are presented.

In the present study, chemical kinetics of etching processes has been investigated.

Here we present the multiscale approach we developed to study the epitaxial chemical vapour deposition (CVD) and etching processes.

Designing, patterning and surface etching processes led to refined structures with very low losses of the incident optical radiation.

This work presents two selectivity amplification processes to achieve a gradient of feature heights ranging over the titanium array after consecutive reactive ion etching processes.

The simulation approach has been tested comparing numerical results and experimental analysis of etching processes for the case of Si etching in HBr/O2 plasma.