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Size-dependent etching effect of Cl radicals on the sidewalls of CNTs is proved by theoretical calculations.
Scanning electron microscopy revealed that surface etching effect induced by APP treatment could be one of the reasons of improved anti-pilling property of knitted wool fabrics.
The surface topography of the modified polymer substrates were observed by SEM and AFM, and no visible etching effect to original surface were found.
Under CVD conditions of Si limited by the mass transport step, there was a limit in the increase of the Cl/H input ratio to increase the deposition rate of Si on Ni substrate due to etching effect of Si.
In terms of polyamide 6 and wool, SEM images revealed that compared to the slight plasma etching effect of fibers with the lowest moisture regain, a thin surface layer of the treated fibers with higher moisture regain was partially or completely peeled off.
For films deposited in the presence of VUV photons, AFM images showed the growth of irregular structure due to substrate etching effect and the deconvolution results of the Si 2p XPS peaks indicated that the proportion of the partly oxidized silicon environment was the major component.
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Surface characterization using transmission electron microscopy shows that etching effects caused by Fe3+ and anisotropic growth induced by lattice mismatch contributed to the final nanocrystal geometry.
Due to the laser etching and electric field etching effects for nickel thin films in particular, thicknesses of the grains too change and it becomes flatter than before.
In addition, water vapor, containing no carbon atoms in the molecule, was also applied to etch the MWCNTs as a weak oxidant which resulted in stronger etching effects on the MWCNTs than methanol and ethanol.
The surface topographic investigation revealed that the surface roughness of coatings was remarkably dependent on the deposition rate and plasma etching effects.
A simple and fast microwave-enhanced wet chemical etching process of SiC particles has been developed for electroless Ni-P plating, and the etching effects are investigated by using BET surface area analysis, SEM, XPS and XAFS.
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