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Holes are etched through this layer in certain locations to make electrical contact with the integrated circuitry.
The researchers call their device a "nanobeam," because it resembles a steel I-beam with a series of round holes etched through the center.
On the flight from Nairobi, I peered down at the thin, twisting valleys etched through parched, dusty-brown land dotted with fluffy green treetops.
Vias etched through the oxide allow to contact the substrate from the electronics layer, so that pixel implants can be created and a reverse bias can be applied.
The spectra of Ti-2p, N-1s, O-1s and Cu-2p before and after the film being sputter etched through the entire film region were also discussed.
The main idea is to use laser to create patterns on the silicon wafer coated with water soluble protection material and the unprotected area is exposed to the high-density plasma which is later etched through.
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To understand the etching behavior, 300 × 300 μmesassareare created by photolithography patterning and inductive coupled plasma dry etching (ICP) to etch through the SiO2 mask layer.
Etching through silicon substrates produced various structural profiles and nanopillar heights as a function of etch time.
After the removal of the photoresist (PR) and directly after an additional buffered oxide etch dip, tetramethylammonium hydroxide (TMAH), 25 wt% at 80 °C, is used to anisotropically etch through the SOI top layer (cf. Fig. 1a).
The fabrication processes of the NTG-LEDs were began to define the several n-contact vias by using an inductively couple plasma (ICP) to etch through the MQW to the n-GaN by an ICP etcher.
Open-ended PSi membranes have been fabricated by methods including anodization to etch thinned areas of silicon wafers ("etch-through" approach) [39 41] and electropolishing to separate an anodized PSi film from the substrate ("lift-off" approach) [19, 26, 42].
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