Deformability of fabricated materials by identifying et, ei, and ep parameters were discussed.
The optimized EP parameters helped with improving the EP microchip system and elevating the average transfection rate from 17.2 to 40.36%, and the inaccuracy of the predicted transfection rate of 43.67% was as small as 3.31%.
EP parameters were: 8 pulses of 100 μs at 1.0 kV/cm and 1 Hz.
Better results can be obtained when using more nodes for the boundary discretization, or a smaller value for eps parameter, but the computational effort is bigger when more nodes are used, and so, for obtaining a good ration accuracy/computational effort, we have to choose a certain range of values for the number of nodes.
We studied the effect of DNA dose and time after treatment as well as various EP pulse parameters on the efficiency of gene expression.
Q(A i, T. ) depends on X, U ·, i, σ, and τ, as well as 2 N EP variational parameters.
The results are analyzed in terms of the energy parameter (Ep), which combines both the ion energy and ion flux.
We have investigated the effects of magnetic field configuration on the plasma characteristic (electron temperature, plasma density, the ion-to-metal flux ratio Ji/Ja and energy parameter Ep) and the microstructure of NbN films grown with a variable magnetron system.
We can choose different values for the boundary elements number N and for the truncation parameter eps.
In order to use the truncation method for evaluating the singular coefficients, we consider a very small parameter eps > 0 to reduce the domain of integration by eliminating the singularity.
