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A complete structural and electronic characterization using Scanning Electron Microscopy-Energy Dispersive (SEM-EDX), BET measurements, X-ray diffraction (XRD), X-ray Photoelectron (XPS), and UV visible spectroscopies was carried out.
Two other surface-sensitive microscopy methods, low-energy and photoemission electron microscopy (LEEM/PEEM), have possibilities for structural characterization by spatially resolved low-energy electron diffraction (μLEED) and chemical and electronic characterization using PEEM.
The formation, electronic characterization, and field emission application of α-Fe2O3NWs were studied.
For the electronic characterization, we use the LBIC technique at the He-Ne wavelength.
Electronic characterization of single-layer NPG field-effect transistors (FETs) was performed, which demonstrated a high on-off switching ratio.
Finally, the resolution limits of both methods are discussed, especially in view of potential measurements by holography for electronic characterization of CIGS in the future.
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Vibrational and electronic characterizations have been performed on the P only and In only samples to obtain an understanding of the thermal annealing behavior in order to obtain a meaningful guide for the fabrication of InP quantum dots (QDs) formed by sequential ion implantation of In and P in SiO2.
Since exfoliation is not a sustainable path beyond basic science, there is a critical need for large area growth of mono-layer MoS2 and its opto-electronic characterization.
The electronic structure characterization on the PtNi nanoparticles demonstrates that the electrons are transferred from Ni to Pt, which can suppress the CO poisoning effect.
GLW performed the electronic transport characterization with contributions from DYS and GW.
Several studies have also demonstrated the importance of electronic structure characterization [17 19].
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