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The obtained optical bandgap is overlapping with the filled with electron deep trap position of 1.2 ±0.09 eV at the SiO2-bulk Si interface [14] that can play an important role due to the developed surface of the studied PS samples.
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Thus, the chief difference between the atoms of the elements of the series is the presence of additional 5f electrons deep within the electron cloud.
This study reveals that the number of traps, including some electron emitting deep levels, increases with increasing Be-doping for the samples grown on (100) plane.
Lifshitz et al. [25, 26] have confirmed the existence of recombination between shallow trapped electrons and deep trapped holes in the surface trap states of CdSe QDs by magnetic resonance.
The observed broad PL signal from Ge/Si islands is associated with the radiative carrier recombination at sharp Ge/Si interface that exhibits type-II band alignment, with a small barrier for electrons and deep potential wells for the holes confined within the Ge islands [9].
The vacancy behaves as a deep electron donor/acceptor, whose electronic properties depend on the charge state.
This deep electron trap has been confirmed using femtosecond photogenerated charge dynamics in TiO2 nanoclusters [36].
It does to be the extra deep electron or hole traps levels near the valence or conduction band edge, respectively.
The electrons still do the E y × B drift until they reach the electron diffusion region deep inside the ion diffusion region.
It has been shown, beyond any doubt, that infaunal irrigation increases the availability of oxygen as an electron acceptor in deep sediment strata.
These deep electron traps (InCu, GaCu, and its complex-DX centers) limits VOC of the devices through fermi level pinning [24, 25, 26].
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