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Inset shows electrode pattern structure.
The Ag electrode pattern is shown in the inset of Fig. 1b.
The electrode pattern was designed to have a spacing of 150 μm between the neighboring fingers.
Finally, the electrode pattern was achieved by dipping the wafer into an acetone solution.
One option is to alter sensor effectiveness by changing the electrode pattern.
The maximum lighting output power was enhanced to 11% in our electrode pattern designs.
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This structure is realized by adopting various metal electrode patterns.
Then, we employed the photoresists in protecting the electrode patterns by lithography technique.
b Optical image of the device showing the Pt electrode patterning (top view).
In this paper, different electrode patterns were designed by varying the widths of grid and gap.
Different coplanar-grid electrode patterns are designed by varying the widths of grid and gap.
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