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It possessed a small trivalent component, and thus, the n-type behavior of electrical property is measured at room temperature.
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The electrical property was investigated by the Hall effect measurements (Ecopia HMS-3000, Korea).
A link between the local morphological and electrical properties is established.
The relationship between R and T phase boundary and their electrical properties is investigated.
Discussion regarding the contribution of CNF type towards the mechanical and electrical properties is also presented.
This indicates that the dominant scattering mechanism that determines electrical properties is a boundary scattering mechanism.
The influence of the interface morphology on the optical and electrical properties is investigated by 3D morphological algorithms.
The characterization of electrical properties is far more complicated and involves the solution of nonlinear differential equations.
Furthermore, silicon, thanks to its exceptional mechanical, physical, and electrical properties is extensively employed in the NEMS and MEMS.
The impact of the 3D architecture of capacitors on their electrical properties is studied for various patterns and geometries.
The relationship between the phase, crystal structure, and electrical properties is investigated and discussed.
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