Sentence examples for double patterns from inspiring English sources
Double patterns were more common in DNA specimens extracted from sputa with lower concentration of AFB bacilli (Table 1); prevalence of double patterns was significantly higher in specimens graded 1+ compared to specimens graded 2+ and 3+ (18/102 vs 21/64 RR = 1.8 95% CI 1.04 – 3.1.04
Only one isolate resistant to rifampicin showed a double pattern while all four isoniazid resistant strains showed double patterns (three in the KatG probes and the other in the inhA probes).
It has also been reported that heteroresistance is an important factor which can affect the accuracy and reliability of drug susceptibility testing results by line probe assays and maybe a reason for double patterns on GenoType® MTBDRplus membranes [ 7, 19].
The double patterns are thought to be due to heteroresistance, i.e simultaneous presence of both drug resistant and susceptible TB bacilli in samples as has been hypothesized elsewhere [ 18].
This panel included 38 of 39 cultures derived from sputum specimens that had produced double patterns and 10 of 12 specimens with disagreements as well as a 30 other randomly selected samples.
In the sample analyzed, GenoType® MTBDRplus results indicated one isolate resistant to rifampicin having a double pattern (positive hybridization with mutant and wild type probes), while all four isoniazid resistant strains showed double patterns (three in the KatG probes and the other in the inhA probes).
In double patterning lithography, within-layer overlay error results in critical dimensions variability.
Layout decomposition is a key computational step that is necessary for double patterning technology.
Moreover, three dimensions (3D) of alignment mark should be optimized to get higher WQs for self-aligned double patterning (SADP).
If a double patterning approach is used for printing a tight metal pitch, then misalignment between the different photos will exacerbate the layout induced effects.
Non-EUV layers assume appropriate multiple patterning schemes, i.e., self-aligned quadruple patterning (SAQP), self-aligned double patterning (SADP) or litho-etch litho-etch (LELE), based on 193-nm optical immersion lithography.
