Sentence examples for double pattern from inspiring English sources

Exact(7)

That Darwin was actually looking for this double pattern of replacement that he found in the mockingbirds and soon after learned of in the tortoises is perhaps even more graphically confirmed by what Darwin, famously, did not see in the Galapagos: any pattern of inter-island replacement by "varieties or species" of the Galapagos finches.

Only one isolate resistant to rifampicin showed a double pattern while all four isoniazid resistant strains showed double patterns (three in the KatG probes and the other in the inhA probes).

When divided into node-positive and node-negative, the double pattern was seen only in node-positive premenopausal patients: it was more pronounced in patients with more than three nodes involved, but was unrelated to tumour size.

In the sample analyzed, GenoType® MTBDRplus results indicated one isolate resistant to rifampicin having a double pattern (positive hybridization with mutant and wild type probes), while all four isoniazid resistant strains showed double patterns (three in the KatG probes and the other in the inhA probes).

Folding it like this will provide for easy cutting of double pattern pieces (sleeves, legs, etc).

You will usually need one starting chain for a single stitch pattern, two for a half double pattern, two or three for a double pattern, and four for a triple pattern.

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Similar(52)

In double patterning lithography, within-layer overlay error results in critical dimensions variability.

Layout decomposition is a key computational step that is necessary for double patterning technology.

Moreover, three dimensions (3D) of alignment mark should be optimized to get higher WQs for self-aligned double patterning (SADP).

If a double patterning approach is used for printing a tight metal pitch, then misalignment between the different photos will exacerbate the layout induced effects.

Non-EUV layers assume appropriate multiple patterning schemes, i.e., self-aligned quadruple patterning (SAQP), self-aligned double patterning (SADP) or litho-etch litho-etch (LELE), based on 193-nm optical immersion lithography.

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