Besides, the security requirement, a certain level of robustness to distortions is required.
Therefore, a more efficient version of this expected distortion analysis is required, as discussed in Section 3.5.
As introduced in Section 2, a predictive model of the end-to-end distortion propagation is required by the full UEP controller in order to optimize the protection allocation.
While the close match in mean attack rates observed between the FullA and SWE scenarios suggests that this assumption may impose little distortion, further study is required to assess this assumption's reliability.
For future extreme ultra violet (EUV) lithography at a wavelength of about 13 nm, out-of-plane deviations sensitively transfer to in-plane distortions and high flatness is required for electrostatic clamping devices.
When numerical simulation methods such as thermal elastic plastic finite element method (FEM) are used to quantitatively predict welding residual stress and distortion, a long computational time is required especially for multi-pass joints.
Each of these PTMs are under the nucleosomal DNA, so distortion of the nucleosome structure is required for protein binding to any of these PTMs within the nucleosome.
Better estimation of the spectrum is required to alleviate the distortion caused by SE algorithms.
Further work is required to assess shrinkage and distortion caused by different osmolality fixatives.
