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Such surface morphology transformation is accompanied by the appearance of a high threading dislocation concentration.
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It is shown that dislocation density concentration is maximum at the intersection of two twins which can potentially provide susceptible site for crack nucleation.
Increase of dislocation concentrations to N d ≈ 5 106 cm−2 is accompanied by increasing of radiation intensity of DEL bands (called peaks D1 D4) in the spectrum of electroluminescence [12].
The released γ′-forming atoms move along the interface towards dislocation concentrations, resulting in the formation of junctions between the γ′-rafts.
High stress, lattice rotation, and dislocation density concentrations were generally observed close to twin tips both within twins and within the immediate neighbouring grains.
Fig. 2 Dependence of EL peaks value (D1 D4 and BEL) of samples subjected to plastic deformation on the dislocations concentration on the surface (111) of p-type silicon.
Excellent control of composition, growth rate, layer thickness, doping concentration, dislocation density, and transport characteristics has been demonstrated.
An excellent control of composition, growth rate, layer thickness, doping concentration, dislocation density, and transport characteristics has been demonstrated in FPA.
The dislocation density and concentration of vacancy clusters were evaluated from the combination of the PAS and XRD results.
Although the mean boundary separation along the ARB normal direction was dependent on the Si concentration, the dislocation density within grains and cells depended very weakly on the Si concentration and stayed around 5 × 1014 m−2.
It can be seen that the trend of the dislocation density depending on Ga concentration follows the carrier concentration, which means that there is a correlation between dislocation density and the corresponding carrier concentration.
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