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For the Cu/Si system, it is well known that thermal annealing is inapplicable to the improvement of the crystalline quality of the Cu films because inter-diffusion easily occurs at the Cu/Si interfaces at temperatures as low as 470 K. Accordingly, ion-irradiation is used to anneal the epitaxial Cu films.
This scheme offers the advantages of being numerically stable with no numerical diffusion and easily parallelizable.
H2O2 by conventional diffusion may easily pass through the membrane into the intracellular space, causing damage to lipids, proteins, and DNA [ 37, 38].
When coupled with the rapid diffusion of easily-accessible medical information and better-informed patients, administrative controls have placed limits on the intensity of SID [85 89].
The diffusion sensitivity is easily varied by changing the parameter known as the b value.
The resulting variance equation contains no spurious production term and differential diffusion is treated easily.
This study demonstrates that the diffusion effect can easily be eliminated by magnetic stirring.
Because of its high contrast-to-noise ratio, lesions with restricted diffusion are usually easily recognised on diffusion-weighted images [10].
It is also shown that the correct amount of "real" diffusion may be easily added to the algorithm when required, for example, for electrons.
From Fig. 3, we note that diffusion is more easily activated and faster [19] at the nanoscale which is then particularly interesting for industrial applications because it lowers the process temperature.
Extension to three-dimensional diffusion can be easily incorporated if required in future applications.
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