"difficulty of fabrication" is a grammatically correct phrase and can be used in written English.
It typically refers to the challenge or complexity involved in making or constructing something. It can also be used figuratively to describe a situation or concept that is hard to create or replicate. Example: The designer's biggest hurdle was the difficulty of fabrication, as the intricate details of the dress required advanced sewing techniques and delicate materials. In this example, "difficulty of fabrication" refers to the challenge the designer faced while creating the dress.
Difficulties of fabrication are reviewed and discussed, such as Y segregation, risks of carburization, local overheating, or difficulty to coat complex shape parts.
Many researchers have reported the resistivity of bismuth nanowires measured using the two-wire method due to difficulty of electrode fabrication with the four-wire method; however, the four-wire method is theoretically more suitable for estimation of the resistivity.
There have been very few reports on Hall measurements in the field of nanowire studies due to the difficulty of electrode fabrication on such a small area [31], and there have been no reports on such with respect to bismuth nanowires.
Furthermore, except for Cr-, Co-, and Ni-doped anatase TiO2, the positive formation energies of other transition metal doping systems imply relative difficulty for fabrication in experiments.
This suggests that the TiO2 thickness adjustment for the J sc improvement (for a given thickness of the photoactive layer) requires the finer tuning, leading to more difficulty in fabrication of the spacer of such a fine-tuned thickness than the case of a ZnO layer.
The new SAW duplexer can overcome the difficulty in fabrication of conventional SAW duplexers while providing the performance matching that of conventional duplexers.
However, difficulty in fabrication of single phase material using conventional methods is the main drawback of this group of ceramics.
However, a number of fabrication difficulties have arisen in studies of such films.
However, the difficulty of the large scale fabrication hinders their practical applications, and the structure tuning of the nanomaterials to optimize PSC is still challenging.
To avoid the fabrication difficulty of a membrane X-ray mask, a built-on X-ray mask technique was employed with negative-toned SU-8 photoresist.
