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Methods are considered for the indirect determination of the mobility of structure-borne sound sources.
The surface roughness scattering affects carrier transport more strongly in narrower channels, showing ∼90%% dominance in determination of the mobility.
However, extrapolation of the data to small driving force allows for the determination of the mobility at all temperatures.
As across these interfaces high biases can be applied, the determination of the mobility constants should be possible.
In 10 nm × 10 nm channels, the dominance of SRS in determination of the mobility becomes larger than 50%% exceeding that of the phonon scattering (PH) when channels are strongly inverted with a line density of carriers >∼106 cm−1.
For electron devices that make use of innovative materials, a basic step in the development of models and simulation computer aided design (CAD) tools is the determination of the mobility curves for the charge carriers.
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Dominance of scattering mechanisms in determination of the carrier mobility has been analyzed to find the major scattering mechanism that suppresses the mobility in sub-10-nm channels.
Following this paradigm, we can evaluate dominance of PH and SRS in determination of the hole mobility.
The determination of the topological mobility requires combinatorial algorithms operating upon a graph representation of the kinematic constraints.
Dominance of various scattering mechanisms in determination of the carrier mobility is examined for silicon (Si) nanowires of sub-10-nm cross-sections.
Reasons of this question will be pursued in further detail in the next subsection by understanding the dominance of scattering mechanisms in determination of the hole mobility.
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