Sentence examples for deposits very from inspiring English sources

Beyond these constituency successes, though, the Lib Dems had a disastrous night with many lost deposits, very few extra seats gained from the redistributive list and a fifth place in Scottish politics behind the Scottish Greens.

Though erosional truncation of deformation features indicates that liquefaction often occurred in the uppermost levels of Navajo dune deposits, very few paleotopographic disruptions due to subsurface deformation have been documented.

This new technique, rich with metal ion plasma, deposits very dense structures and offers virtually defect free coatings (free of droplets as observed in cathodic arc technique and under-dense structures observed in standard dc sputtering).

On electron microscopy, GBM showed normal thickness of lamina densa with occasional to scattered small to medium subepithelial deposits, very rare small subendothelial deposits and rare mesangial deposits.

This permits depositing very uniform films, with inhomogeneities lower than 2.5%, at high deposition rate (1.5 3 nm/s), and maintaining the substrate temperature relatively low (250 °C).

Pelagic sediments, either terrigenous or biogenic, are those that are deposited very slowly in the open ocean either by settling through the volume of oceanic water or by precipitation.

Similarly both wild type Arabidopsis and the mutant 35S PMR4-GFP showed extensive silicification of leaf tissue while the pmr4 mutant deposited very little silica in its leaf tissues.

In addition, apatite was deposited very well on the interconnected irregular pores on the surface of the scaffolds after incubation in SBF, while the size of precipitated apatite was reduced by increasing the soaking time.

The use of such a standardized, paper-based packaging substrate as material for printing electronics is challenging in terms of its high surface roughness and high ink absorption rate, especially when depositing very thin films with inkjet printing technology.

The charge trapping layer was fabricated mostly by self-assembly processes, depositing very thing old layers on the oxide-covered silicon substrates, then post-annealing process to form gold NPs by Ostwald ripening.

SERS effect remained strong, for the HfO2 film was deposited very thin, and its thickness could be controlled precisely, benefitting from the self-limiting nature of the ALD method [29 31].