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We describe a large variety of thin film deposition techniques such as thermal evaporation, sputtering, plasma enhanced chemical vapor deposition used to coat liquid substrates.
The test sample with gradient pore structure was prepared by centrifugal classification deposition used the stainless steel powder as raw material.
Compared with other metal-deposition ways, such as laser or electron beam deposition processes, the plasma deposition used in the current HPDM is the most economical one.
Two-dimensional direct numerical simulations are used to quantify the sensitivity of ignition kernel formation and subsequent edge-flame propagation to the oxidizer temperature and the initial width and amplitude of O-atom deposition used to trigger ignition in an axisymmetric counterflow of heated air versus ambient hydrogen/nitrogen.
Nakamura's suit focuses on one patent covering a new method of chemical vapor deposition used in making the LEDs and lasers.
In those cases, however, hydrophobic nanoporous alumina surfaces were prepared by liquid-phase deposition in contrast to the vapor-phase deposition used in our work.
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Hsien-Ping, Gang Chen, Bo Yu, Zhifeng Ren, Shuo Chen, and Bed Poudel, "Metal Deposition Using Seed Layers," US Patent No. Patent No. 8,580,100, Nov. 12, 2013.
(A) Schematic presentation of wrinkled PDMS substrate preparation (a c), Au NP film fabrication on it (d) and CdTe QDs deposition using layer-by-layer method (e,f).
Electrophoretic deposition using this innovative technique was found more superior to the conventional electrophoretic deposition using vertically arranged electrodes where a very broad particle size range was used.
Adhesive Cu deposition using an inverter plasma was studied.
plasma assisted chemical vapour deposition using tetraethoxysilane as precursor.
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