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Passivation quality was better for Al2O3 deposited at 200°C deposition temperature than at 100°C.
The surface roughness of the deposited film increases gradually with deposition temperature, which is attributed to the enhanced crystallization of the film at a higher deposition temperature.
When the deposition temperature attains 180 °C, the deposited film becomes polycrystalline.
As the deposition temperature increased, the crystallization of the deposited film was enhanced gradually.
The deposition temperature is at room condition.
The deposition temperature was 150 °C.
The deposition temperature is shown at each measurement point.
Growth rate also decreased with the deposition temperature increased.
The deposition temperature was fixed to 65 °C [71].
The deposition temperature was fixed at 60 °C.
(b) Deposition temperature of 850°C and (c) 950°C.
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