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The thickness of the CaP coating deposited on the mirror-polished Si substrate in the same deposition run with TiO2 NTs was determined by optical ellipsometry (SE) 95±± 5 nm.
Films coming from the same deposition run were annealed in air at 200 and 300 °C.
More than 150 individual samples spanning a range of thicknesses and interface conditions were prepared in a single deposition run.
The target sputter cleaning times (e.g. after a reactive deposition run) are long (compared to DC sputtering) due to the same reason.
RF-magnetron sputtering of the HA target in a single deposition run was performed to prepare a coating on the surface of TiO2 NTs prepared at 30 and 60 V.
Combining this in-situ tunable CNT growth technique with electron beam induced deposition of catalyst patterns, we have fabricated a bent CNT on a cantilever in one single, continuous deposition run.
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The substrate temperature and bias in all the deposition runs were 575 °C and −120 V, respectively.
The industrial exploitation of the pulsing process is impeded by the fact that, during long-term deposition runs, eventually all surfaces will be covered with the insulator.
In a deposition running hundreds of pages, William Fitzsimmons — a legendary Harvard hockey goalie, Class of '67, who has been Harvard's admissions dean since 1986 — offered a rare look into the admissions office.
Al, Cr and Cr/Al 50/50 target segments were assembled pairwise to synthesize Cr1−xAlxN hard coatings in the range of 0.21 ≤ x ≤ 0.74 at a high compositional resolution within two deposition runs.
The source-to-substrate-distance for all deposition runs was 30 cm.
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