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The properties and micro structure of vapor-deposited films depend on the deposition methods and conditions.
Unfortunately, due to inexperience with deposition methods, many plasmonics researchers deposit metals under the wrong conditions, severely limiting performance unnecessarily.
Electrodeposition and plasma sputtering deposition methods are compared to conventional techniques for depositing gold on diffusion layers.
There are two deposition methods: Thin, below 1 µm thickness, layers are deposited by chrome plating, and are used for decorative surfaces.
For all deposition methods, the stripping rate was constant at a given as-deposited coating thickness.
Modified two-step deposition methods were proposed.
Four kinds of deposition methods are proposed.
The deposition methods were APS and SPS.
Physical and chemical vapor deposition methods, such as sputtering and epitaxy, are some examples of vapor phase deposition methods.
Their electrochemical activities vary with different substrates and deposition methods.
These distribution differences can be well attributed to the film deposition methods.
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