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With the particles trajectories obtained, the deposition location and so the dust-cake profile can be approximated.
The deposition location depends on the toroidal magnetic field, flux and density profiles, and can be controlled by tilting the mirror in the ECRH launcher.
A dedicated feedback control for the poloidal motion of the launching mirrors is being developed, in order to adapt the tracking of the power deposition location to the dynamic changes of magnetic surfaces in real-time.
Based on a highly (100×) accelerated version of TORBEAM, the software implementation as a diagnostic process uses parallelization and achieves cycle times of 15 20 ms for determining the radial deposition location of 12 beams in the plasma.
Plasma control techniques that use electron cyclotron (EC) resonance heating and current drive such as control of neoclassical tearing modes require accurate control of the deposition location of EC beams.
The proposed alternative entrance modifications were based upon structural alterations of the inlet system (such as a jetty extension or submerged weir) and non-structural scenarios (such as a change of the time of the dredging campaign or the deposition location of the dredged material).
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Figure 6 also shows the XRD patterns of different deposition locations under various oxygen flow ratios.
Disorder also reduces electron and phonon conductivity keeping the damage energy longer at the deposition locations, eventually favoring defect recombination.
In theory, to consider the maximum travel distance, the 100th percentile of the travel distance should be calculated from the simulated deposition locations.
Spatially distributed erosion simulations facilitate the detection of net erosion and deposition locations in the field and could be used to design intensive measurement campaigns and guide erosion control practices in the future.
Another interesting phenomenon is that the deposition rate depends on both the oxygen flow ratio and the deposition locations, as reported in Table 1; this effect is attributable to a certain number and energy angular distribution of the sputtered particles from the target [27].
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