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We developed a novel technique for high-rate growth of microcrystalline silicon films by plasma-enhanced chemical vapor deposition, designing a novel cathode with interconnected multi-holes, which leads to generate uniformly flat-distributed stable high-density-plasma spots near cathode-surface.
We have developed a novel technique for large-area high-rate-growth of microcrystalline silicon films by plasma-enhanced chemical vapor deposition, designing a novel cathode with interconnected multi-holes, which generates uniformly flat-distributed stable high-density plasma spots near the cathode-surface.
We have developed a novel technique for large-area high rate growth of microcrystalline silicon films by plasma-enhanced chemical vapor deposition, designing a novel cathode with interconnected multi-holes, which leads to produce uniformly flat-distributed stable high-density plasma spots near cathode surface.
In the recent decades rather than using a single value, non-deposition design concept has been further modified to develop self-cleansing models based on higher number of parameters considering flow, fluid, sediment and channel characteristics.
Recent technological developments in chemical vapor deposition reactor design now allow for the low-cost, en masse production of well-aligned, reproducible carbon nanotubes.
This model-independent uniformity criterion is used to optimize film thickness uniformity in a representative CVD system; its applicability to other film deposition system design and optimization problems is discussed.
Due to in-plane uniaxial anisotropy of a film could lead to well soft magnetic properties at gigahertz frequency, hence, better absorption properties, several methods including induced magnetic field [10], induced stress [11] during deposition, multilayer design [12], and post-annealing under external magnetic field [13, 14], were investigated.
European air pollution abatement policy, in the framework of the UNECE Convention on Long-range Transboundary Air Pollution (LRTAP Convention) and the European Union Clean Air for Europe (CAFE) programme, has used critical loads and their exceedances by atmospheric deposition to design emission abatement targets and strategies.
This paper presents an optimal deposition-parameter design for Indium sulfide (In2S3) thin films, using radio frequency (RF) magnetron sputtering for soda-lime glass substrates.
In this work, a simple and ultrasensitive cholesterol biosensor based on enzymatic silver deposition was designed by immobilizing cholesterol oxidase (CHOD) and cholesterol esterase (CHER) onto the surface of gold nanoparticles (Au NPs) modified screen-printed carbon electrode (SPE).
For the first time, a facile, cost effective, and mass-scalable direct synthesis approach, based on a chemical bath deposition, is designed for quantum dot(QD -based MoS2 layers using (NH4)6Mo7O24 and thiourea (CH4N2S) as precursors.
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