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We have found that despite of a very limited space of this access, in the first stage of the Cu0 deposition process, a Cu-upd on Au is formed, with LSV peak potential Ep = 0.385 V versus Ag/AgCl, though the rate of upd formation is lower than that for a upd on an unmodified Au, as evidenced by the decrease in the Cu deposited mass and the deposition charge.
The porous α-Co(OH 2 film deposited on the porous electrode with a deposition charge of 1 coulomb (C) exhibited a specific capacitance as high as 1345 Fg−1 at 2 and1 and even 1200 Fg−1 at a high rate of 40 Ag−1.
A deposition charge of 30 C cm−2 produces a porous deposit with a mass of ca 1.7 mg cm−2.
Film thickness can be controlled by the passed deposition charge.
Multilayered Pt/Ir/Pt films were electrodeposited over titanium substrates, controlling the film thickness by the deposition charge.
PPy/p20 surfaces consistently demonstrate the lowest impedance and largest charge capacity for a given deposition charge.
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Polymeric films are deposited by varied deposition charges (Qs) ranging from 62 to 620 mC cm−2 for comparison.
Poly[(R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate R --3- 1-pyrrolyl propyl-N- 3,5-dinitrobenzoyl -α-phenylglycinate
Poly{3-[12- p-methoxyphenoxy dodecyl]thiophene} films with different thickness were Poly{3-[12- p-methoxyphenoxy dodecyl]thiophenesPoly{3-[12- p-methoxyphenoxy dodecyl]thiophenetion charges.
Fig. 7 SEM images of the surfaces pure PANI and PPy films at low (424 mC/cm2) and high (7.07 C/cm2) deposition charges (Qdep) as indicated.
The galvanostatic charge/discharge characteristic of a film was investigated by chronopotentiometry and the morphology of the films electrodeposited at different deposition charges were monitored using FE-SEM.
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