Sentence examples for deposition I from inspiring English sources

Typical geographic settings include areas of active erosion or deposition (i.e., steep slopes or floodplains), areas of quartzite bedrock or quartz sand (i.e., major desert and dune regions), and wetlands.

Two types of surface textures were fabricated prior to TiAlN coating deposition: (i) nano-scale textures fabricated by femtosecond laser, and (ii) micro-scale textures fabricated by Nd YAG laser.

The composite deposition was carried out by cyclic voltammetry, potentiostatic or galvanostatic electrolysis of suspensions of the RuO2 or IrO2 particles in two different media described as appropriate for WO3 deposition: (i) a colloidal suspension obtained from Na2WO4 and H2SO4 or (ii) a solution obtained by dissolving W powder in aqueous H2O2.

An Al and Cr gradient NiCoCrAlYSiB coating was prepared by a two-step deposition: (i) deposition of a NiCoCrAlYSiB layer onto Ni-based superalloy surface by arc ion plating (AIP); and (ii) co-deposition of NiCoCrAlYSiB and Cr Al by AIP and magnetron sputtering (MS), respectively.

Obtained results demonstrated that for several compounds, total deposition, i.e. the sum of wet and dry deposition, was marginally higher than wet deposition alone.

The films were synthesized using pulsed filtered cathodic arc and magnetron sputter deposition, i.e. techniques far from thermodynamic equilibrium.

Structural defects within Ta2O5 monoclinic structures were obtained by crystallisation at 850 °C in atmosphere O2 H2O of amorphous thin films deposited by injection metal-organic chemical vapour deposition (i-MOCVD) on Si substrates.

The chapter describes a small part of microelectronic prestidigitation called ionized physical vapor deposition (I-PVD).

This chapter provides an overview of the development of a basic physical model of ionized physical vapor deposition (I-PVD).

An axisymmetric, multicomponent initiated chemical vapor deposition (i-CVD) apparatus was designed to study the vapor-phase growth of glassy poly methyl methacrylate) (PMMA) films.

Ionized physical vapor deposition (I-PVD), in comparison with other process steps for ULSI (ultra large-scale integration) fabrication, presents some interesting and unique challenges in the selection of a plasma source.