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In this work, piezoelectric zinc oxide (ZnO) thin films are deposited under different deposition conditions using RF magnetron sputtering method.
The films deposited under different deposition condition have been characterized using X-ray diffraction studies and PL measurements.
After a systematic study of the specific capacitances of the PG/NF electrodes deposited under different potentials with different deposition times, we found that deposition potential mainly influences the deposition rate and a longer deposition time is needed to achieve the maximum capacitance under more positive potential.
(A) Plots of specific capacitances for PG/NF electrodes deposited under different potentials with the deposition time of 500 s versus scan rate.
The (Ti,Cr,Al,Si N coatings were deposited under different substrate bias voltages and effect of the deposition parameter on the composition, structure and mechanical properties was investigated.
The coatings deposited under different conditions were compared in term of microstructure and corrosion behavior.
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To discern the roles of Ei and Ji, the films are deposited under three different conditions of magnetron discharge It.
Textured YSZ films were deposited under three different IBAD conditions: (a) films were bombarded by a single ion beam source (SIBAD), (b) films were bombarded by a single ion beam source for a time alternating from the two symmetric directions (AIBAD), and (c) by dual ion beam assisted deposition (DIBAD) where the film was bombarded simultaneously from the two symmetric directions.
Figure 2 SEM images of PG/NFs deposited under -1.2 V with different deposition times.
The deposit could form on the stagnation plate readily and thus enabled us to investigate the formation of deposit under different operating conditions.
Our results indicate that Ni Cu P deposit has more corrosion resistance and lower corrosion current density (icorr) value than Ni P deposit under different conditions.
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