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System of nanocoatings deposited by using physical vapour deposition is planned to be applied in the artificial heart prosthesis.
The spaces in the Si nanowall were filled with Al2O3 deposited by using atomic layer deposition (ALD).
Nanosrystalline CrAlSiN and CrTiAlSiN coatings were deposited by using a cathodic-arc deposition system with lateral rotating arc cathodes.
The silicon nitride films were deposited by using a plasma enhanced chemical vapor deposition system and process parameter effects were systematically characterized by 26−1 fractional factorial experiment.
Diamond-like carbon (DLC) films were deposited by using a plasma enhanced chemical vapor deposition (PECVD) onto Si(1 0 0) wafer.
The CrN coatings are deposited by using a reactive cathodic arc plasma deposition technology in an industrial scale, while the interlayer of chromium produced by electroplating.
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Y3Al5O12 Gd thin films were co-deposited by using a multi-source radio frequency reactive magnetron sputtering process.
Here, nanocomposites of carbon, cobalt and cobalt carbide are deposited by ALD using cobalt acetylacetonate with propanol as a reducing agent.
CdS thin films are deposited by PLD using a target prepared by these CdS quantum dots.
Similar results were reported for AlN films deposited by PEALD using NH3 plasma on Si substrate [20].
J V curves of five different DSSCs fabricated with nanostructured ZnO photoanodes deposited by PLD using the optimized condition.
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