Sentence examples for deposit quality from inspiring English sources
For various hydrodynamic methods (rotating disc electrode and static vertical or horizontal electrode), the results indicate that, the presence of only small quantity of tartaric acid, may induce significant changes on deposition rates and deposit quality.
In microelectronic applications, deposit quality is determined on the molecular scale by the action of additives.
This paper presents new insights regarding copper extraction and recovery methods from chalcopyrite ore in aqueous chloride media using leaching and electrowinning as well as steps for deposit quality improvements.
The field reduces the roughness of the copper deposit, but the current efficiency can be maximized by controlling the system galvanostatically, which allows a high copper deposition rate at overpotential lower than 0.5 V in the applied field, with smooth deposit quality.
The presence of thiourea generally improved deposit quality over that obtained in additive-free solutions, but caused the formation of microscopic nodules and the deposits to appear slightly cloudy, resulting in lower reflectances than that of a polished uncoated copper surface.
The intention was to initially deposit good quality fingerprints onto the substrate and, where possible, oblique lighting was used to confirm that the quality and clarity of those recently deposited fingerprints were identifiable.
It was possible to deposit high quality coatings of NiAl intermetallic at rates comparable to those of non-metallic coatings.
However, it has been difficult to deposit high quality transparent conducting oxide thin films on plastic substrates due to their high process temperature.
A new method was developed to deposit high quality manganese coatings from MnSO4 aqueous solution without any additives (sulphur or selenium compounds).
Non-vacuum SPM method was used to deposit high quality p-type L-NiO films.
Atomic layer deposition (ALD) is an alternative way to deposit high-quality dielectric films [20].
