Sentence examples for deposit frequency from inspiring English sources

First, examining data from the deposit contract treatments in greater depth, we investigate factors affecting deposit frequency and size, and discuss possible ways of increasing deposits.

Amorphous selenium and crystalline tellurium thin films were deposited by frequency assisted thermal deposition in vacuum – a new approach for preparation of thin films based on condensation of the evaporated material on an excited substrate, at which vibrations with audible input frequencies are applied.

Importantly, our control cases also had corpora amylacea deposits and the frequency of these deposits aligned with the frequency of C4F6 reactive spheroids in our control cases.

The results compared with the observed damage distribution show that significant amplification does not occur on most of the caliche deposits for frequencies up to 10 Hz.

Amorphous hydrogenated carbon (a-C H) a-C Hilicon doped and:H (Silicon andoped:H/Si-DLC multila-C Hd films were deposited by low frequency pla-C Henhanced chemical vapour deposition (LF PECVD).

Amorphous hydrogenated carbon (a-C H), Si-conta-C Hg a-C:H and a-C:H/Si-containing a-C H multila-C Hd films hand been deposited by low frequency pla-C H/Si-containingca-C H/Si-containingn (LF-PECVD) from cyclohexa-C H/Si-containinghylsila-C Ha-C Hxtures.

The structural and tribological properties of diamond-like nanocomposite (DLN) thin films, deposited by radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) on the pyrex glass or silicon substrate using the combinations of siloxane and silazane based gas precursors, are discussed.

Nitrogen-doped thiophene plasma polymer [N-ThioPP] thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method.

The Ag layers were deposited by DC magnetron sputtering with a power density of 1.73 while, while the ITO coatings were deposited by radio frequency magnetron sputtering with a power density of 2.12 W/cm2.12

The films were deposited by radio frequency (RF) magnetron sputtering.

The films were deposited with radio frequency [RF] magnetron sputtering.