The fabrication process for asymmetric metallic pyramid arrays on PDMS substrates is depicted in Figure 2. First, an array of circular patterns is made in a silicon nitride (Si3N4) film on a Si wafer via photolithography (Karl Suss, MA-6) and dry etching (STS, 320PC).
The process of implementation was depicted in various forms, including an array of linear, non-linear, recursive, or reiterative series of processes, steps, stages, or phases.
The results from the three arrays are depicted in heat maps, in which the expression of each miRNA across samples was assigned a color value (Fig. 2).
Internally, the use of triplicate spotting of all array elements and distribution of the triplicate elements in different regions of the array allows the comparison of hybridization uniformity across the array, as depicted in Figure 4. Initially, we determined the effectiveness of printed slides by hybridization with total RNA from control and salt-stressed cells.
The fabrication process of PASiNP arrays is depicted in Fig. 1.
These impulse responses were recorded by using the microphone array depicted in Figure 5.
Figure 2a depicts two arrays of nanochannels containing the processed electrodes and microfluidic structures.
For two-dimensional case, the PDF is depicted in the left side of Fig. 1 for b=−a=10,c=0.05 and mathbf{R} = left[ begin{array}{cc} 1 & 0.5 0.5 & 1 end{array} right].
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The co-array has an aperture of length 2(2 M -1) Nd0 with contiguous elements between - (MN + M -1 d0 and (MN + M -1 d0, as depicted in Figure 2. Figure 2 Difference co-array of the extended co-prime array configuration.
