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In this paper, the process and layout optimizations for improving the isolation performance of deep trench structures on SOI substrate are proposed.
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In the view of process flow, the reasons for forming weak points (located at the trench bottom) in deep trench structure are analyzed.
Device processing was begun using an inductively coupled plasma (ICP) reactive ion etching (RIE) system with a BCl3/Cl2 gas mixture to isolate a 130-nm-deep mesa and etch a periodic trench structure.
Comparison of typical oxide VCSEL, trench oxide VCSEL, and photonic crystal oxide VCSEL employing trench structure is presented.
Many "deep structures" functioned exceptionally well.
Even in the ocean's deepest trench, about 11 kilometers down, researchers have discovered abundant life.
Intensity of optical emission from the HV pulsed plasma became stronger in a deeper trench, indicating the plasma generation in the trench by a hollow cathode effect.
A 25-cm-deep trench (shown in inset) was sampled at station 8.
The Earth's deepest trench is the Mariana Trench which extends for about across the seabed.
A new Deep Trench Isolation (DTI) structure with high-voltage capability (BV > 150 V) and latch-up suppression (log Ic/Ie) < −2 in adjacent pockets) is experimentally demonstrated in this work.
In the forests around Mantu, near Bukavu, villagers have dug waist-deep trenches and covered them with branches.
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