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Inductively coupled plasma reactive-ion etching (ICP-RIE) is first applied to decrease the thickness of a Si substrate for light-addressable potentiometric sensor (LAPS) characterization.
The effect of H2SeO3 is advantageous as allows simultaneously improve the coverage and decrease the thickness of the CdS film during the electrodeposition process.
In particular, the addition of trace Ti into the Zn-22Al filler metal can refine the microstructures and decrease the thickness of the intermetallic compounds layer produced in the Cu/Al brazing.
Particularly, the addition of trace Ce into the Zn 22Al filler metal can refine the microstructures and decrease the thickness of the layer of intermetallic compounds produced in the Cu/Al brazing joints.
Due to the application of a Cu mesh, a reticular braze seam with enhanced ductility was fabricated, which can inhibit the formation of Ti Cu intermetallic compounds in the braze seam and decrease the thickness of the Ti3SiC2 layer adjacent to ZSC.
In this building system, SFRSCC was used to totally eliminate the need for conventional reinforcement and to decrease the thickness of the panel's outer layers, with consequent reduction of the global self-weigh of the panels, while GFRP connectors aimed to significantly decrease thermal bridging effects.
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Power consumption was reduced by decreasing the thickness of substrate.
The interface capacitance can be increased by employing high-k dielectric material and by decreasing the thickness of the dielectric film.
The CO2 permeability is increased by decreasing the thickness of the CO2-selective layer.
The gravity-driven convection decreases the thickness of the depletion zone seriously.
The reflection loss value got lower by decreasing the thickness of absorbers.
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