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In N codoped p-type ZnMgO films have been prepared by direct current reactive magnetron sputtering.
This enhances current reactive rule-based scalability approaches and basic prediction techniques by a hybrid prediction solution.
VOx thin film is deposited by direct current reactive magnetron sputtering as a thermal detector.
Current reactive and standalone network security products are not capable of withstanding the onslaught of diversified network threats.
Compared the commanded reactive power current with the current reactive power current, the difference is integrated with an adjustable PI controller to meet the desired reactive current command.
Direct current reactive magnetron sputtering was implemented to successfully deposit dark Ti(C,O,N) thin films on silicon substrates.
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A rate-based model of a counter-current reactive absorption/desorption process has been developed for the absorption of SO2 into NaHCO3/Na2CO3 in a packed column.
The dependence of the mechanical and electrical properties of titanium nitride thin films deposited on silicon substrates by direct-current reactive magnetron sputtering technique on argon gas flow (in the range of 8 to 20 sccm) was investigated.
The TiO2-SiO2-Ag nanostrucompositesposites were obtained by depositing TiO2 films (100 nm thick) on the surface of the as-implanted silica substrates using a direct-current reactive magnetron sputtering system.
TiO2 film with a thickness of about 680 nm was prepared by direct-current reactive magnetron sputtering deposition on silica glass and then was subsequently capped with triangular Ag NPs (schematically described in Figure 1d).
Here, a model for two-layer biphasic flow and homogeneous reaction is proposed for co-current reactive extraction, demonstrating that localization and intensification of reaction occurs in the region between the entrance and crossover.
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