In electrolytic deposition, or electroplating, a pure coating of completely controlled thickness of zinc may be applied without heat.
Electrospinning can be used to control thickness, composition, and porosity of tissue engineering scaffolds.
Hence controlling thickness during continuous manufacturing of sustained release tablets was crucial to ensure reproducible dissolution.
The results show that this method is capable of producing controlled thickness profiles on large substrates.
Pulsed current process allows depositing polypyrrole layer selectively with highly controlled thickness through the application of number of pulses.
Since existing atomic layer deposition (ALD) shows ultrahigh conformity and compatibility to semiconductor processing [21], it is a powerful tool for plasmonic material deposition with precisely controlled thickness.
In conventional electronics, high-k dielectrics have been deposited by atomic layer deposition (ALD), because this technique can produce ultrathin, conformal oxide dielectrics with precisely controlled thickness [105-109].
Laser cladding represents an advanced hard facing technology for the deposition of hard, corrosion and wear resistant layers of controlled thickness onto a selected area of metallic substrate.
We propose a new concept for the design of high-efficiency photocells based on ultra-thin (submicron) semiconductor films of controlled thickness.
Green sheets for ZrO2/NiCrAlY functionally graded material (FGM) were prepared using tape casting in order to control thickness and layer design in FGM.
