Alpha-cellulose samples (~250 μg) were analysed using continuous flow low-temperature pyrolysis in the Stable Isotope Facility at the Department of Geological Sciences University of Canterbury, New Zealand.
Growth rings (0.2 mg) were individually wrapped in silver foil, with δ18O measured at least twice for each sample using both a continuous flow high-temperature conversion elemental analyzer (TC/EA), as well as a Thermo Finnigan MAT253 mass spectrometer at the Tokyo Institute of Technology (Sakashita et al. 2016).
Each chamber, containing air and fuel, was fired sequentially to provide a nearly continuous flow of high-temperature, high-pressure gases that were fed through nozzles to the turbine wheel.
An in situ ATR-IR spectroscopic cell suitable for studies at solid-liquid interface is described including the design and experimental details in continuous flow mode at elevated temperatures (230 °C) and pressures (30 bar).
Intramolecular thermal cyclization and benzannulation reactions of the Gould Jacobs and Conrad Limpach types were performed in a designed continuous flow reactor system at temperatures in the range of 300 360 °C and under high pressure conditions (100 160 bar) with very short residence times (0.45 4.5 min) in tetrahydrofuran as a low-boiling point solvent.
The infrared transmission spectra were collected using a Vertex 70V FTIR spectrometer equipped with a Janis ST-100-FTIR (Janis Research Company, LLC, Woburn, MA) continuous flow cryostat and a room temperature DTGS detector.
Two optimal control problems concerning a stirred continuous flow adsorber are studied, with temperature being the control variable: (i) minimize time at which a given amount is adsorbed, (ii) maximize time for which the outlet adsorbate concentration does not exceed a given level.
In the next step, the prepared sample was loaded inside a horizontal reactor CVD system and then heated from room temperature to 775 °C in the presence of 60sccm continuous flow of Ar gas at 100 °C/h temperature increasing rate.
Thin films with a thickness of 20 nm have been deposited on glass substrates at room temperature under a continuous flow (50 sccm) of argon.
The dry reforming reaction of CH4 was carried out in a continuous flow reactor, at 1 atm and temperature of 700 °C, with a constant stoichiometric feed mixture of CH4 and CO2 (1:1) and a total flow rate of 40 ml/min.
