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It is mandatory for SIMNRA simulation program to count a given element content in thin film as the following formula: Fig. 8 Cross-sectional HRTEM micrograph of CrN/MoN multilayered film at 6 rpm Y={sigma}_Rcdot varOmega cdot Qcdot rho cdot {d}_0/ cos alpha.
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As the Li2S content in the thin film increases, the ionic conductivities of the thin films increase from n = 1 to n = 3.
The inverse dependence of transformation temperature on Zr content in the thin films with a high Zr content is due to the formation of a NiZr phase during the crystallization heat treatment.
The increase of the nickel content in oxide thin films of composition NixMn1-xOy (with x in the range from 0 to 0.17) results in the increase of specific capacitance up to a maximum for about 10 at% Ni.
The analysis of Ce L3-edge XANES data has shown that the position of the Ce 4f15d and 4f05d states progressively shift towards lower energies with decreasing cerium dioxide content in the thin films.
This study is intended to investigate the amorphicity region of Ni + Al content in Zr Cu Ni Al thin film.
Reservoir spaces consist of a few residual micropores and secondary pores formed by dissolution of feldspars and analcite, and the content of pores in thin sections is commonly lower than 0.1%%.
The self-assembly of nonionic-cationic poly oligoethylene glycol methyl ether methacrylate -poly 2-vinylpyridine) (POEGmethacrylate -poly 2-vinylpyridinetent is characterized in thin filmethacrylate -poly 2-vinylpyridine
The silica content in the hybrid thin films was varied from 0 to 50 wt%.
On increasing the deposition temperature, the deposit Fe content in the FeCoNi thin films decreased from 83to72atomicmic percent (at.%) and the Co content increased from 17to2727 at.%.
The lutetium content in Lu Ni alloy thin films increases as the potential was made more cathodic, reaching a maximum value of 28.77 at.%, and then decreases.
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