Sentence examples for consequent annealing from inspiring English sources

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From mixed (anatase and rutile) bulk particles, anatase TiO2 nanotubes are synthesized in this study by an alkaline hydrothermal reaction and a consequent annealing at 300 400 °C.

By plasma treatment of polymer surface combined with consequent annealing or metal deposition can be prepared materials applicable both in tissue engineering as cell carriers, but also in integrated circuit manufacturing.

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The combination of plasma treatment with consequent thermal annealing and/or metal sputtering led to the change of surface morphology and its elemental ratio.

As it is obvious from Figure 3, the consequent thermal annealing leads to the significant increase of the surface roughness both for electrically continuous and discontinuous evaporated nanolayers.

The increased solubility of heavily cholesteryl modified siRNA in the presence of rHSA facilitated duplex annealing and consequent interaction that allowed in vivo studies using multiple cholesteryl modifications.

The molecular H2 in the gas state inside the nanocavities expands upon annealing with consequent increase of the volume of the nanocavities, which would favour their coalescence, leading to bigger and bigger voids.

The combination of Ar+ ion irradiation, consequent sputter metallization (platinum) and thermal annealing of polymer surface will be summarized.

The generic "touch down" PCR protocol included 7 "touch down" cycles for the increased specificity (98 °C for 10 sec, 67 °C for 30 sec, 72 °C for 1 min, with annealing temperature decreasing 2 °C at each consequent cycle) followed by 20 to 30 cycles of 95 °C for 15 sec, 57 60 °C for 30 sec, and 72 °C for 1 min and a final extension at 72 °C for 10 min.

Growth of the Si and silicide phases in the alloy is induced by annealing of the mechanically alloyed sample, with a consequent increase in the size of the Si particles obtained after ultrasonication.

Figure 3 shows that, upon annealing, the Si-H and Ge-H bonds break with consequent release of H. H has totally been released from Ge already after 1 h annealing, while it still remains somewhat bound to Si as mono- and di-hydride.

Our results indicate a dual effect of H2 annealing on the surface morphology of the copper substrate, and consequent graphene growth quality, whereby H2 passivates and smoothens the Cu surface, causing it to become morphologically more favorable for graphene growth, but may in large quantities make the surface less chemically favorable, limiting the quality of grown graphene.

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