Sentence examples for conditions for preparing from inspiring English sources

In the present study, we investigated the appropriate conditions for preparing protoplasts of the KU-41 strain, because preparation of a sufficient number of protoplasts is essential for construction of a genetic transformation system.

The optimal pretreatment conditions for preparing hydrolysate with higher sugar yields were then determined.

Magnetron sputtering deposition may provide the necessary conditions for preparing such alloys due to its far-from-equilibrium deposition conditions.

The operation conditions for preparing a Cu/ZnO-based multicomponent catalyst by a coprecipitation method were optimized.

The aim of this study was to determine the optimal processing conditions for preparing nanocapsules by the emulsification-diffusion method using ultrasound in the homogenization step.

The influence of surfactant concentration, type, and mixing ratio on lemon oil solubilization was investigated, with the aim of identifying suitable conditions for preparing stable microemulsions and nanoemulsions.

The identified optimum condition for preparing Fe/Er TiO2 was 1.5 mol%, 1.25 mol% and 450 °C for [Er], [Fe] and [CT], respectively.

The optimal operation condition for preparing CMC micro-particles in the range of this work is: the pressure of 200 bar, the temperature of 55 °C, with 500 μm nozzle and 1 cm spraying distance in the presence of deionized water as cosolvent.

Synthesis conditions such as the calcination temperature and the content of Br−were investigated to optimize the ideal condition for preparing LiMn2O4 yBr y with the best electrochemical performances.

The other condition for preparing the higher adsorption capacity activated carbon was activation time 120 min and activation temperature 450 °C at a constant H3PO4 concentration (4.25 mol/L).

In order to minimize the effect of surface area variation, we carefully controlled the process condition for preparing the quantum dot-sensitized TiO2 nanotube arrays and kept the thickness of the passivation layer deposited as about 1.5 nm.