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The frequency and percentage of presentation of the commonest 30 conditions are presented in Table 3.
These conditions are presented in Table 4.
The conditions are presented in Table 1.
Working conditions are presented in Table 2.
Explicit nonoscillation and oscillation conditions are presented.
magnetron sputtering under UHV conditions are presented.
Details of these conditions are presented in [5, 6].
Recent tests applying various configuration and operating conditions are presented.
Possibilities to counteract the worsening of water conditions are presented.
The sufficient stability conditions are presented for such systems.
The associated interface and boundary conditions are presented.
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